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Oxford PlasmaPro 100 Cobra ICP Etch System
Oxford Instruments PlasmaPro 100 Cobra (2025)
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Highly configurable inductively coupled plasma (ICP) Etching Systems. The PlasmaPro 100 Cobra provides advanced plasma etching capabilities for semiconductor and MEMS device fabrication with precise control over etch parameters and excellent uniformity.
Capabilities
- ✓Inductively coupled plasma (ICP) etching
- ✓Highly configurable system
- ✓Advanced plasma etching
- ✓Semiconductor device fabrication
- ✓MEMS device fabrication
- ✓Precise etch parameter control
- ✓Excellent uniformity
- ✓Deep reactive ion etching (DRIE)
- ✓Anisotropic etching
Specifications
| model | PlasmaPro 100 Cobra |
| plasma type | Inductively coupled plasma (ICP) |
| applications | Semiconductor, MEMS |
| configuration | Highly configurable |
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