Helios NanoLab G3 UC DualBeam (FIB/SEM)
Available

Helios NanoLab G3 UC DualBeam (FIB/SEM)

FEI Helios NanoLab G3 UC

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The FIB/SEM dual-beam system provides the unique capability to add or subtract material at precisely defined locations with high spatial resolution. Its integrated nano-manipulator allows preparation of TEM lamellas. 3D reconstructions is enabled through a "slice and view" before computationally recombining into a single 3D volume. Additional features include:

Capabilities

  • βœ“An XHR SEM monochromated (UC) field emission electron gun (FEG), constant power lens optics and beam decelerator identical to the Verios for its SEM component.
  • βœ“Its Tomahawk ion column features superior high current performance (65 nA max beam current) accelerating voltage from 500 - 30 kV, 2-stage differential pumping and time-of-flight correction for a tighter beam and more accurate scan profile.
  • βœ“Available gas injections are: platinum deposition, carbon deposition, selective carbon mill, and insulator enhanced etch.
  • βœ“Oxford energy dispersive X-ray spectrometer (EDS) for elemental mapping and analysis.
  • βœ“EasyLift EX NanoManipulator for easy TEM lamella creation and lift-out.

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