Asher | Asher
Available

Asher | Asher

Plasma Etch PE 50 Asher

Request Quote
Commercial Rate

PE 50 Asher, manufactured by Plasma Etch, uses Oxygen plasma to remove organic materials such as photoresist. It can be operated either in RIE mode or in soft Plasma Etching/Ashing mode. Other gases can be included to tweak etching/ashing performance. RF power of up to 100 W can be applied.

Similar Instruments

Oxford Instrument Plasma Lab 100 Inductively Coupled Plasma (ICP) - Scientific Equipment
Available
Scientific Equipment

Oxford Instrument Plasma Lab 100 Inductively Coupled Plasma (ICP)

Washington University in St. Louis
Commercial Rate
Request Quote
Edwards 306 Vacuum Coater - Scientific Equipment
Available
Scientific Equipment

Edwards 306 Vacuum Coater

Washington University in St. Louis
Commercial Rate
Request Quote
Kurt J. Lesker PVD 75 RF and DC - Scientific Equipment
Available
Scientific Equipment

Kurt J. Lesker PVD 75 RF and DC

Washington University in St. Louis
Commercial Rate
Request Quote
Kloé SA  - Scientific Equipment
Available
Scientific Equipment

Kloé SA

Washington University in St. Louis
Commercial Rate
Request Quote