Asher | Asher
Available

Asher | Asher

Plasma Etch PE 50 Asher

Request Quote
Commercial Rate

PE 50 Asher, manufactured by Plasma Etch, uses Oxygen plasma to remove organic materials such as photoresist. It can be operated either in RIE mode or in soft Plasma Etching/Ashing mode. Other gases can be included to tweak etching/ashing performance. RF power of up to 100 W can be applied.

Similar Instruments

Reactive Ion Etch (RIE) | Oxford Plasma Lab 100 Inductively Coupled Plasma (ICP)
available
Microfabrication and Nanofabrication

Reactive Ion Etch (RIE) | Oxford Plasma Lab 100 Inductively Coupled Plasma (ICP)

Oxford Instrument • Plasma Lab 100 Inductively Coupled Plasma (ICP)

$75.00/hr
Washington University in St. Louis
0.0(0)
Thermal Evaporator | Edwards 306 Vacuum Coater
available
Microfabrication and Nanofabrication

Thermal Evaporator | Edwards 306 Vacuum Coater

Edwards • 306 Vacuum Coater

$75.00/hr
Washington University in St. Louis
0.0(0)
Sputter Deposition Tool | Kurt J. Lesker PVD 75 RF and DC
available
Microfabrication and Nanofabrication

Sputter Deposition Tool | Kurt J. Lesker PVD 75 RF and DC

Kurt J. Lesker • PVD 75 RF and DC

$75.00/hr
Washington University in St. Louis
0.0(0)
Mask Aligner 4" | Kloé SA
available
Microfabrication and Nanofabrication

Mask Aligner 4" | Kloé SA

Kloé SA •

$75.00/hr
Washington University in St. Louis
0.0(0)