
Available
Asher | Asher
Plasma Etch PE 50 Asher
Request Quote
Commercial Rate
PE 50 Asher, manufactured by Plasma Etch, uses Oxygen plasma to remove organic materials such as photoresist. It can be operated either in RIE mode or in soft Plasma Etching/Ashing mode. Other gases can be included to tweak etching/ashing performance. RF power of up to 100 W can be applied.
Similar Instruments

available
Microfabrication and Nanofabrication
Reactive Ion Etch (RIE) | Oxford Plasma Lab 100 Inductively Coupled Plasma (ICP)
Oxford Instrument • Plasma Lab 100 Inductively Coupled Plasma (ICP)
$75.00/hr
Washington University in St. Louis
0.0(0)

available
Microfabrication and Nanofabrication
Thermal Evaporator | Edwards 306 Vacuum Coater
Edwards • 306 Vacuum Coater
$75.00/hr
Washington University in St. Louis
0.0(0)

available
Microfabrication and Nanofabrication
Sputter Deposition Tool | Kurt J. Lesker PVD 75 RF and DC
Kurt J. Lesker • PVD 75 RF and DC
$75.00/hr
Washington University in St. Louis
0.0(0)

available
$75.00/hr
Washington University in St. Louis
0.0(0)