Direct Write E-Beam Lithography System
Available

Direct Write E-Beam Lithography System

Raith 150Two (2025)

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Commercial Rate

Raith Electron Beam Lithography/Imaging 150Two. Training Requirements: 4 to 6 hours. Daily Entry Fee is required. Please create a 'Daily Entry Fee' reservation in addition to Raith tool reservation. The Raith 150two is an electron beam write system that can image to less than 10 nanometers. Main Applications: Nano-lithography, Imaging. Up to 30kV. SE and BSE detectors.

Capabilities

  • ✓Electron beam lithography
  • ✓Direct write capability
  • ✓Sub-10nm imaging
  • ✓Nano-lithography
  • ✓30kV acceleration
  • ✓SE and BSE detectors
  • ✓High resolution patterning
  • ✓Advanced lithography
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Specifications

manufacturerRaith
model150Two
resolutionLess than 10 nanometers
voltageUp to 30kV
detectorsSE and BSE
applicationsNano-lithography, Imaging
training time4-6 hours
additional feeDaily Entry Fee required

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