Available
Direct Write E-Beam Lithography System
Raith 150Two (2025)
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Commercial Rate
Raith Electron Beam Lithography/Imaging 150Two. Training Requirements: 4 to 6 hours. Daily Entry Fee is required. Please create a 'Daily Entry Fee' reservation in addition to Raith tool reservation. The Raith 150two is an electron beam write system that can image to less than 10 nanometers. Main Applications: Nano-lithography, Imaging. Up to 30kV. SE and BSE detectors.
Capabilities
- ✓Electron beam lithography
- ✓Direct write capability
- ✓Sub-10nm imaging
- ✓Nano-lithography
- ✓30kV acceleration
- ✓SE and BSE detectors
- ✓High resolution patterning
- ✓Advanced lithography
Specifications
| manufacturer | Raith |
| model | 150Two |
| resolution | Less than 10 nanometers |
| voltage | Up to 30kV |
| detectors | SE and BSE |
| applications | Nano-lithography, Imaging |
| training time | 4-6 hours |
| additional fee | Daily Entry Fee required |
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