electron beam_lithography
JEOL JSM-7001F E-beam Writer with Nanometer Pattern Generation System
By JEOL - JSM-7001F with Nabity NPGS (2025)
University of Massachusetts Amherst
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The Electron Beam Lithography system is based on a JEOL JSM-7001F Thermal Field Emission SEM equipped with a Nabity Nanometer Pattern Generation System which supports e-beam lithography and an image database. Capable of patterning as small as 10 nm.
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