Available
Tube Furnace | Lindberg/Blue M
Request Quote
Commercial Rate
Lindberg tube (glass)furnace can be heated up to 1100 C to grow oxide on silicon wafer under ambient conditions. Furnace is run in batch conditions. Typical SiO2 growth on Silicon substrate is ~430 nm for 15 hr run and ~820 nm for 80 hr run at 1100 C.
Similar Instruments
available
Microfabrication and Nanofabrication
Reactive Ion Etch (RIE) | Oxford Plasma Lab 100 Inductively Coupled Plasma (ICP)
Oxford Instrument • Plasma Lab 100 Inductively Coupled Plasma (ICP)
$75.00/hr
Washington University in St. Louis
0.0(0)
available
Microfabrication and Nanofabrication
Thermal Evaporator | Edwards 306 Vacuum Coater
Edwards • 306 Vacuum Coater
$75.00/hr
Washington University in St. Louis
0.0(0)
available
Microfabrication and Nanofabrication
Sputter Deposition Tool | Kurt J. Lesker PVD 75 RF and DC
Kurt J. Lesker • PVD 75 RF and DC
$75.00/hr
Washington University in St. Louis
0.0(0)
available
$75.00/hr
Washington University in St. Louis
0.0(0)