Hitachi NB5000 Focused Ion & Electron Beam System

Focused Ion Beam System NB5000 Focused Ion & Electron Beam System Precision milling at micro/nano scale Key Functionalities •High precision ion nanofabrication for material characterization and sample preparation (e.g., TEM lamella) •STEM Observation •EDX analysis •Integration into lab workflow via support for holders for TEM systems Key Configuration Parameters •Dual ion beam and electron column configuration •Ga liquid metal ion source; 1-40kV; magnification of 60-250,000x •ZrO/W Schottky emission electron source; 0.5-30,000kV; magnification of 70-800,000x •Front entry for bulk samples, 5 axis motorized stage •Side-entry stage supporting holders for HF3300 and HT7700 TEMs •STEM unit (brightfield/darkfield) •Energy dispersive Xray spectrometer (EDX) •3-axis micro-sampling system •Deposition gas system (W,C)