Available
Mask Aligner 4" | Kloé SA
Request Quote
Commercial Rate
An easy to use UV-LED mask aligner that can perform photolithography on substrates up to 4" diameter and with resolution as small as 2 microns. Front-side alignment can now be performed with joypad controls in a matter of minutes. It can be useful in many research applications not limiting it to microelectronics, microfluidics, optics & photonics.
Similar Instruments
available
Microfabrication and Nanofabrication
Reactive Ion Etch (RIE) | Oxford Plasma Lab 100 Inductively Coupled Plasma (ICP)
Oxford Instrument • Plasma Lab 100 Inductively Coupled Plasma (ICP)
$75.00/hr
Washington University in St. Louis
0.0(0)
available
Microfabrication and Nanofabrication
Thermal Evaporator | Edwards 306 Vacuum Coater
Edwards • 306 Vacuum Coater
$75.00/hr
Washington University in St. Louis
0.0(0)
available
Microfabrication and Nanofabrication
Sputter Deposition Tool | Kurt J. Lesker PVD 75 RF and DC
Kurt J. Lesker • PVD 75 RF and DC
$75.00/hr
Washington University in St. Louis
0.0(0)
available
Microfabrication and Nanofabrication
Probe Station | Signatone S-1008 and Keithley 238 high current source measurement unit
Signatone, Keithley • S-1008 and 238
$75.00/hr
Washington University in St. Louis
0.0(0)