ICP380 Metal etch
Available

ICP380 Metal etch

Oxford Instruments PlasmaLab 100 (2025)

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System specification: RIE with 380mm ICP source. 3", 4", 6" and 8" clamps available. Please note what clamp size you will need at booking. Substrate Temperature: -150C to 400C. Chiller Mode: -10 to 80C, Cryo Mode: -10C to -150C, Heat Mode: 80C to 400C. Please note what mode you will need at booking. Available gases: SF6, C4F8, CF4, CHF3, Ar, He, O2, N2, CH4, H2, Cl2, Bcl3. Training is required before use.

Capabilities

  • ✓ICP plasma etching
  • ✓Metal etching
  • ✓380mm ICP source
  • ✓Multiple substrate sizes
  • ✓Temperature control
  • ✓Multiple gas options
  • ✓Cryo and heating modes
  • ✓Professional etching
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Specifications

manufacturerOxford Instruments
modelPlasmaLab 100
source380mm ICP
substrate sizes3", 4", 6", 8"
temperature range-150°C to 400°C
modesChiller (-10 to 80°C), Cryo (-10 to -150°C), Heat (80 to 400°C)
gasesSF6, C4F8, CF4, CHF3, Ar, He, O2, N2, CH4, H2, Cl2, Bcl3