Nicolet ECO 1000

Imaging & Analysis Facility Use The Nicolet ECO 1000 is a high-performance Fourier Transform infrared (FT-IR) spectroscopy instrument designed to serve the semiconductor manufacturing industry. It can be used for measuring dopant concentration levels in dielectric films (BPSG, PSG, FSG, etc.), hydrogen levels in silicon nitride films, epitaxial film thickness, MEMS device thickness, and substitutional carbon and interstitial oxygen levels in silicon wafers. The ECO 1000 can be used with wafers ranging from 100 mm (4-inch) to 200 mm (8-inch) in diameter. The system is capable of centering and aligning these standard wafer sizes automatically, providing accurate and repeatable sampling anywhere on the surface of the wafer. 75 mm (3-inch) wafers can be used as well, but with only very limited positioning freedom and no centering and aligning capability. The system can also be used to analyze non-semiconductor samples (except liquids, gases and powder), as long as the samples can be easily mounted on a custom-made sample holder and fed into the instrument. The source of laser energy in the ECO 1000 analyzer is a Melles Griot HeNe laser with a nominal 1 mW(maximum 1.2 mW), continuous 632.8 nm laser head. The system has two modes for FT-IR measurements: reflection and transmission. Laboratory for Integrated Science and Engineering © 2025 Harvard CNS. All rights reserved. Center for Nanoscale Systems *