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JEOL JSM-7001F E-beam Writer with Nanometer Pattern Generation System
JEOL JSM-7001F with Nabity NPGS (2025)
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The Electron Beam Lithography system is based on a JEOL JSM-7001F Thermal Field Emission SEM equipped with a Nabity Nanometer Pattern Generation System which supports e-beam lithography and an image database. Capable of patterning as small as 10 nm.
Capabilities
- ✓Electron beam lithography
- ✓10 nm minimum patterning
- ✓Thermal field emission SEM
- ✓Nanometer pattern generation
- ✓Image database support
- ✓High resolution patterning
- ✓Direct write lithography
Specifications
| model | JSM-7001F |
| minimum feature | 10 nm |
| system | Nabity NPGS |
| type | Thermal field emission SEM |
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$161.00/hr
University of Massachusetts Lowell
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