The load-locked AJA ORION 8 Sputtering System currently has three RF and four DC confocal magnetron sputtering sources installed. Current source materials available include copper, aluminum, silicon dioxide, titanium dioxide, aluminum oxide, indium tin oxide, magnesium oxide, tantalum oxide, cobalt, palladium, niobium, silver, nickel, tantalum, sammarium, sammarium cobalt, zirconium, chromium, vanadium, and Permalloy (Ni/Fe). Programmable control of deposition parameters and cycling allows simultaneous or sequential deposition and repetition of deposition cycles. Substrate heating up to 750°C is also programmable.

Capabilities

✓RF and DC magnetron sputtering
✓Load-locked operation
✓Multiple material targets
✓Programmable deposition control
✓Substrate heating up to 750°C
✓Sequential/simultaneous deposition
✓Wide range of materials

Request Time on This Instrument Contact Facility

Specifications

model	Orion 8
sources	3 RF + 4 DC magnetron
heating	Up to 750°C
materials	20+ metals, oxides, alloys