AJA ATC2000 Sputter Coater 1
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AJA ATC2000 Sputter Coater 1

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AJA sputter coater 1 is an AJA ATC 2000 sputter system with four A320 XP UHV magnetron sputter guns capable of sputtering conductive and dielectric materials using DC and RF Argon plasma. Co-sputtering (up to three guns, two DC and one RF power supply) is available. The system accommodates 2” targets (1/4” thick) including various materials such as Cr, Ti, Cu, Mo, Al, Ag, Mg, Ni, Fe, Co, Si, Ge, W, ITO, SiO2, Si3N4 and MgO. Sample holder size is 4” in diameter. Substrate heating is available at up to 400 C. Reactive sputtering with O2 and N2 is also available.

Capabilities

  • Location 336 MRL
  • Related Research Techniques Deposition Tools
  • Related Research Cores Micro/Nano Fabrication and Cleanroom

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