Available
The PWM32 Spinner provides a complete range of spinner requirements. It is possible to coat substrates with adjustable spinning speeds from 50 to 10,000 RPM. The operator can manually turn on the vacuum to the chuck to over-ride the Auto control, assuring the sample has sufficient vacuum
Capabilities
- âś“Location 388 MRL
- âś“Related Research Techniques Lithography
- âś“Related Research Cores Micro/Nano Fabrication and Cleanroom
