Oxford RIE A - BCL3, Cl2, SF6, AR
Available

Oxford RIE A - BCL3, Cl2, SF6, AR

Oxford Plasmalab 80+ (2025)

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Commercial Rate

Oxford Plasmalab 80+ Reactive Ion Etcher. Daily user entrance fee required. Please book in increments of 30min. Available gases: Cl2, Bcl3, SF6, Ar. Training is required before use.

Capabilities

  • Reactive ion etching
  • Chlorine etching
  • BCl3 etching
  • SF6 etching
  • Argon processing

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