Available
Cambridge NanoTech Atomic Layer Deposition System
Cambridge NanoTech Savannah 100 (2025)
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Commercial Rate
The Cambridge NanoTech Savannah 100 Atomic Layer Deposition (ALD) system is available to deposit very conformal and precise thicknesses of various thin films. Our unit can currently be configured with the precursor chemicals to deposit hafnium oxide, aluminum oxide, titanium dioxide, zinc oxide, and platinum.
Capabilities
- ✓Atomic layer deposition
- ✓Conformal coating
- ✓Precise thickness control
- ✓Multiple oxide deposition
- ✓Metal deposition
- ✓High aspect ratio coverage
- ✓Low temperature processing
Specifications
| model | Savannah 100 |
| materials | HfO2, Al2O3, TiO2, ZnO, Pt |
| technique | ALD |