Available
Atomic Layer Deposition
FIJI ALD System (2025)
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Commercial Rate
Daily user entrance fee required. Please book in increments of 30min. ALD with Loadlock capable of Plasma or Thermal ALD. Substrate size: Up to 200mm. Substrate Temperature: up to 500C. Precursors Available: Al, Hf, Pt, Si, Nb, Ti others on request. Training is required before use.
Capabilities
- ✓Atomic layer deposition
- ✓Plasma ALD
- ✓Thermal ALD
- ✓200mm substrate capability
- ✓500°C temperature capability
- ✓Multiple precursors
- ✓Loadlock system
- ✓Precise thickness control
Specifications
| manufacturer | FIJI |
| substrate size | Up to 200mm |
| temperature | Up to 500°C |
| modes | Plasma or Thermal ALD |
| precursors | Al, Hf, Pt, Si, Nb, Ti, others on request |
| booking | 30 minute increments |
