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Nanonex NX-2608BA Nanoimprint Lithography Tool
Nanonex NX-2608BA (2025)
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The Nanonex Nanoimprint Lithography Tool provides state-of-the-art capability for patterning, alignment, and direct printing of multiple materials for printed electronics. Features all forms of nanoimprint (thermoplastic, photocurable, simultaneous thermal and UV NIL), Air Cushion Press technology, sub 10 nm imprint resolution, sub-1 µm overlay alignment, substrate size up to 8 inch wafers, temperature range 0 to 250°C, pressure range 0 to 500 psi.
Capabilities
- ✓Nanoimprint lithography
- ✓Thermoplastic imprinting
- ✓Photocurable imprinting
- ✓Thermal and UV NIL
- ✓Air Cushion Press technology
- ✓Sub 10 nm resolution
- ✓Precision alignment
- ✓8 inch wafer capability
Specifications
| model | NX-2608BA |
| resolution | Sub 10 nm imprint |
| alignment | Sub-1 µm overlay |
| substrate size | Up to 8 inch wafers |
| temperature | 0 to 250°C |
| pressure | 0 to 500 psi |