Available
R2R Contact Lithography Active Alignment Registration System
Custom Contact Lithography System (2025)
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Moving web tool uses gravure/meyer-rod coating of functional resist or thin-film with contact print to mask pattern for direct photolithographic exposure by UV source. Imaging feedback enables active alignment of patterns.
Capabilities
- ✓Roll-to-roll contact lithography
- ✓Active pattern alignment
- ✓Gravure coating
- ✓Meyer-rod coating
- ✓UV photolithographic exposure
- ✓Imaging feedback system
- ✓Pattern registration
Specifications
| technique | Contact lithography |
| coating | Gravure/meyer-rod |
| alignment | Active pattern recognition |
| exposure | UV source |