The AJA sputter deposition tool provides industry standard vacuum deposition capability for a range of metals, dielectrics, and magnetic materials. R2R deposition on 6 inch wide films with 4 magnetron sputtering sources including one for magnetic materials. Features 2000 W RF gen and 5 kW variable frequency (5-350 kHz) pulsed DC generator with dual output option. Includes plasma cleaning system before deposition and bidirectional motorized rollers with web tensioning.

Capabilities

✓Roll-to-roll sputtering deposition
✓6 inch wide film processing
✓Metals, oxides, dielectrics deposition
✓Magnetic materials deposition
✓4 magnetron sputtering sources
✓RF and pulsed DC generators
✓Plasma cleaning system
✓Web tension control

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Specifications

web width	6 inches
sources	4 magnetron (1 magnetic)
rf power	2000 W RF
dc power	5 kW variable frequency pulsed DC
materials	Metals, oxides, dielectrics, magnetic