Available
Oxford RIE C - ICP65
Oxford PlasmaLab 80 ICP65 (2025)
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Oxford Instruments PlasmaLab 80 with ICP source. Available gases: C4F8, SF6, Ar, O2, CF4, CHF3.
Capabilities
- ✓ICP etching
- ✓Reactive ion etching
- ✓C4F8 processing
