Oxford RIE C - ICP65
Available

Oxford RIE C - ICP65

Oxford PlasmaLab 80 ICP65 (2025)

Request Quote
Commercial Rate

Oxford Instruments PlasmaLab 80 with ICP source. Available gases: C4F8, SF6, Ar, O2, CF4, CHF3.

Capabilities

  • ✓ICP etching
  • ✓Reactive ion etching
  • ✓C4F8 processing
Request Time on This InstrumentContact Facility

Similar Instruments

Oxford Plasmalab 80 - Scientific Equipment
Available
Scientific Equipment

Oxford Plasmalab 80

University of Massachusetts Lowell
Commercial Rate
Request Quote →
Oxford Plasmalab 80+ - Scientific Equipment
Available
Scientific Equipment

Oxford Plasmalab 80+

University of Massachusetts Lowell
Commercial Rate
Request Quote →
March Instruments PM-600 - Scientific Equipment
Available
Scientific Equipment

March Instruments PM-600

University of Massachusetts Amherst
Commercial Rate
Request Quote →