Plasma Cleaner
Available

Plasma Cleaner

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Commercial Rate

The High Power Expanded Plasma Cleaner from Harrick Plasma controls surface properties by removing residual nanoscale organic contamination and modifying surface chemistry. The PlasmaFlo accessory includes a vacuum gauge and a digital barometer and allows for quantitative control of the gas flow rate, process pressure monitoring, and gas mixing or independent control of two different gases. At ANTEC, the Plasma Cleaner is utilized for nanoscale surface cleaning and surface activation in preparation of biomaterials, scaffolds, and microfluidic devices. Please acknowledge the use of ANTEC equipment when data obtained in our core is published, used for proposal or grant submissions, or included in your presentations. Acknowledgement helps demonstrate ANTEC’s value to the Northwestern University Research community and contributes to our efforts to secure funding for new instruments and services. See sample text.

Specifications

Power applied to RF coilLow Setting: 30WMedium Setting: 38WHigh Setting: 45W
Vacuum pressure range1–1999 mTorr
Number of gas inputs2

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