The AJA Orion-8 Magnetron Sputtering System is a high performance thin film deposition tool meant to deliver maximum performance and results for our research community. The system is equipped with a fast-cycle load-lock system which eliminates the need to vent the process chamber to load substrates, reducing the pump down time and contaminations of targets and interior chamber surfaces. It utilizes a motorized rotating substrate holder to achieve excellent uniformity. This machine is featured with complete recipe control to deliver best process reproducibility. This equipment was funded through the Illinois MRSEC NSF Award Number DMR-2309037. Its use should be acknowledged in any published works, with the wording: “The authors acknowledge the use of facilities and instrumentation at the Materials Research Laboratory Central Research Facilities, University of Illinois, supported by NSF through the University of Illinois Materials Research Science and Engineering Center DMR-DMR-2309037.” Please also send a copy of the publication (email or hard copy), or the publication information (citation, DOI, or conference name and paper/poster title) to mrl-facilities@illinois.edu.
Capabilities
- ✓7 two-inch sputter sources. They are Au, Al, Ag, Ti, Cu, Cr, Mo.
- ✓Capable of co-sputtering of up to 4 sources.
- ✓Capable of both RF and DC sputtering.
- ✓Accommodates up to 4-inch wafer size sample.
- ✓Film uniformity better than +/-2.5% over a 4-inch diameter wafer.
- ✓Capable of heating samples up to 850 Celsius.
- ✓Load-lock system to enable fast sample loading and unloading.
- ✓Location 336 MRL
- ✓Related Research Techniques Deposition Tools
- ✓Related Research Cores Micro/Nano Fabrication and Cleanroom
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