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X-Ray Photoelectron Spectrometer (XPS)
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X-ray photoelectron spectroscopy (XPS) is the most used surface analytical technique. For the outermost ten nanometers of a material, it provides semi-quantitative elemental compositions and oxidation state or chemical bonding information. XPS can detect any element except hydrogen and helium with a detection limit of about 0.3 atomic percent. Most materials stable in ultrahigh vacuum can be analyzed with little to no sample preparation. Ion-sputtering depth profiling also allows for data to be collected for up to a couple of microns depth.
Capabilities
- ✓Determination of surface composition and bonding
- ✓Nondestructive elemental depth profiles
- ✓Destructive elemental depth profiles several thousand angstrom (Å) into the sample
- ✓Variable temperature analysis
- ✓Monochromatized aluminum and gold X-ray sources
- ✓Non-monochromatized magnesium and titanium X-ray sources
- ✓UV radiation lamp for UPS analysis
- ✓Argon (Ar) source for depth profiling, capable of producing both cluster ions and atomic Ar+ ions
- ✓Hot and cold stage for variable temperature analysis
- ✓Spatial resolution of less than 3 µm
- ✓Holds samples up to 7mm thick
- ✓Monochromatized aluminum X-ray source
- ✓Non-monochromatized magnesium and zirconium X-ray sources
- ✓UV radiation lamp for UPS analysis
- ✓Ar+ source for depth profiling
