VersaProbe II Scanning X-ray Photoelectron Spectroscopy microprobe

Surface and Materials Characterization Laboratory is available for students and researchers. The VersaProbe II Scanning X-ray Photoelectron Spectroscopy microprobe, a multi-technique surface analysis instrument, allows to investigate what elements (from the periodic table) compose the surface of a sample and how these elements are structured together. Samples can be cleaned inside the system by an Argon cluster bombardment to remove the contaminants present at the surface. With the ion argon gun, it is also possible to atomically dig out the surface to investigate the inside of the sample. System: Physical Electronics Versa Probe II. Ultra-High Vacuum (UHV) base pressure: 4×10-8 Pa. Probing X-ray beam from 10 µm up to 200 µm in diameter Large area mapping with micrometric resolution, XPS from small structures (14×14 µm2) made possible by Raster scanned, micro-focused, monochromatic x-ray beam. Samples: conductors, semi-conductors, insulators (with charge compensation). Samples: solid, powder, organics, SAMS, etc… if they are UHV compatible. Sample size: 1×1 mm2 up to 2.5” Dia. Sputtering capabilities with Ar+ ion beam from 100 eV up to 5 KeV. Cleaning and mild sputtering with (Ar cluster)+ ion beam: cluster size from 1000 Ar atoms (max 25 eV per Ar atom) up to 2500 Ar atoms (min 1 eV per atom), beam energy from 2.5 KeV up to 25 KeV. Angle resolved XPS. Depth profiling. Sample Temperature adjustable from -150oC up to 500oC.