Elionix ELS-S50EX Electron Beam Lithography (EBL)

Electron Beam Lithography (EBL) System EBL Model: Elionix ELS-S50EX Capabilities: This tool is a high resolution 50kV field emission microscope and lithographic tool using electrons. It is capable of writing features as small as 10 nm over a large field size (3 x 3 mm). It features low distortion beam deflection and high uniformity over the exposure field, and high stitching accuracy (± 20 nm).