Nanofab PECVD System | Oxford Instrument

Oxford Instrument's Nanofab provides the capability to deposit thin films of SiO2, SiN, p-Si, a-Si, Graphene, Nanotubes, etc. The standard gasses connected to the instrument are Ar, N2O, N2, CH4, 2%SiH4 in Ar, NH3, and H2. For more process capability, please contact IMSE staff.