etching
Oxford PlasmaPro 100 Cobra ICP Etch System
By Oxford Instruments - PlasmaPro 100 Cobra (2025)
University of Massachusetts Amherst
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Highly configurable inductively coupled plasma (ICP) Etching Systems. The PlasmaPro 100 Cobra provides advanced plasma etching capabilities for semiconductor and MEMS device fabrication with precise control over etch parameters and excellent uniformity.
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