E-Beam Evaporator | Kurt J. Lesker PVD 75

The Kurt J. Lesker PVD 75 thin film deposition system is a versatile platform equipped for electron-beam (4 pockets) evaporation. Electron beam evaporation stands out as the preferred method for high melting point materials, offering directional control advantageous for liftoff metallization. Meanwhile, the Lesker PVD 75 Electron Beam Evaporation apparatus employs this technique to deliver precise management of deposition rates, minimal contamination in films, and rapid deposition rates. It provides pellets for ebeam deposition including Al, Cr, Cu, Au, and Ti, with an upward evaporation orientation and four pockets for multilayer deposition. Monitoring film thickness is facilitated by a Quartz Crystal Microbalance (QCM), while accommodating substrates of up to 150 mm in size with rotation capabilities of up to 20 rpm.