Microfabrication and Nanofabrication
Asher | Asher
By Plasma Etch - PE 50 Asher
Washington University in St. Louis
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PE 50 Asher, manufactured by Plasma Etch, uses Oxygen plasma to remove organic materials such as photoresist. It can be operated either in RIE mode or in soft Plasma Etching/Ashing mode. Other gases can be included to tweak etching/ashing performance. RF power of up to 100 W can be applied.
Min. Booking: 1 hours
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