Image of Ellipsometer | J.A. Woollam alpha-SE spectroscopic
Microfabrication and Nanofabrication

Ellipsometer | J.A. Woollam alpha-SE spectroscopic

By J.A. Woollam - alpha-SE spectroscopic

Washington University in St. Louis
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The J.A. Woollam alpha-SE ellipsometer can measure film properties non destructively. Some of the film properties include optical constants, film thickness and roughness. The change in polarized light properties during the measurement can measure film thickness from micrometer length scales down to angstrom length scales precisely. The instrument is typically used for dielectric, semiconductor and organic thin films. The instrument has a wavelength range from 380 nm - 900 nm, and can operate at three angles (65, 70 and 75 degrees) in manual mode.

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