Focused Ion Beam System

Maker: FEI (Thermofisher) Model: Nova 200 Nanolab Features: Dual beam system Acceleration voltage: 5kV to 30 kV E-beam resolution: <1.1 nm at 15 kV Ion (Ga) beam resolution: 7 nm at 30 kV Four (4) gas injectors (Pt, SiO2, C, etch) Digital pattering system Applications: Imaging (SE detector) Cross section imaging (typical area: 20×10 microns) TEM sample preparation (thickness 50 nm – 100 nm)